NUFLARE

Epitaxial growth is a process that forms a layer of monocrystalline material on a silicon wafer along a uniform crystalline direction. An epitaxial growth system is employed to create epitaxial wafers for light-emitting diodes (LEDs) as well as power devices for hybrid and electric vehicle applications. NuFlare has over 30 years of experience in the manufacture and sales of epitaxial growth systems. In 2013, we commercialized a metal organic chemical vapor deposition (MOCVD) system for the manufacture of gallium-nitride-on-silicon (GaN-on-Si) LEDs. In 2014, we released for a CVD system for silicon carbide (SiC) devices. Today, we are recognized worldwide as a manufacturer of high-efficiency and sophisticated epitaxial growth systems... An EB mask writer is utilized to create a set of photomasks, eoch defining a pattern layer in integrated circuit fabrication thot will be transferred onto silicon wafers by the lithography process. As the scale of semiconductor integration increased, EB..

Also known as: NuFlare Technology, NuFlare Technology America, Inc., NuFlare Technology, Inc.

Primary location: Yokohama Japan