ODAOPTICS

Mr. Oskotsky has more than thirty years progressive experience in Optical Design, Optical Engineering, Optical Manufacturing and Metrology, research and development, management and training. He holds more than 30 patents and published numerous papers in a field of Optical Engineering. Most of his developments have been patented. Also, Mr. Oskotsky has developed designs, breadboards, prototypes and production of the optics for Optical Lithography Projection Optics and Illumination Systems, wafer inspection lenses and others... Mr. Oskotsky was Principal Optical Designer of MSII, MSIII, MS193, MSV and MSVII Illumination Systems, Principal Optical Designer of ASML AT1400 and AT1600 lithography systems; he managed concept development and optical design and analysis of Maskless Lithographic Tool. He was responsible for metrology and alignment systems optical design, analysis and production support... Mr. Oskotsky was responsible for the interaction with customers, business plan..

Primary location: Stamford United States