WGL INDUSTRIES

Development of a compact flow cytometer using deep-difusion proportional mode Avalanche Photodiode elements... Shipley Assignee to IMEC (Leuven, Belgium): Principle responsibility was evaluating 193 nm photoresist samples on the /900 and /1100 ASML scanners. Provided support for customer studies at IMEC and participated in IMEC evaluations and research. Conducted research on the mechanism of line edge roughness formation. 2001-2003... Project Chemist: R&D of 157 nm photoresist materials. Participated in resist development using the 157 nm stepper at Sematech. Studied the diffusive transport and reaction dynamics of small molecules in fluoropolymers 2001