AXIC

AXIC, Inc. was founded in 1980 as a company to develop surface science equipment for the semiconductor, electronics, and general scientific community. The early stages of the company were involved with determining future equipment requirements for the semiconductor industry which could be filled by a small company with strategic knowledge of surface measurement requirements... AXIC provides thin film solutions enabling low cost, high value XRF and Plasma Systems for ICP, DRIE, PECVD and x-ray metrology... AXIC has a proven track record of serving the needs of semiconductor, production, pilot line, university, and research facilities since 1980. Our systems are used worldwide for etch and deposition of thin films, plasma surface treatment, plasma cleaning, and x-ray fluorescence (XRF) measurement of metal films and metal film stacks. AXIC offers complete customer support and maintains an applications and demonstration lab for your specific process requirements.

Also known as: Axic Corporation, AXIC, Inc.