PHIETCH.ORG

φetch implements a computational framework for the topography evolution of features during plasma etching. The input of the framework is the species fluxes just above the wafer and the output is the profile evolution of the etched features. It results from the coupling (see Fig. 3) of three modules: A) A local flux calculation module, which calculates the local fluxes inside the etched features (e.g., trenches, holes), B) a surface chemistry module which describes the etching mechanisms on the surface, and C) a profile evolution algorithm which is based on the level set method. The inputs of this framework are the species fluxes at the bulk plasma and the output is the topography of the etched feature. More information about the framework is included in Refs... Most of the algorithms and numerical methods of φetch were developed during the PhD thesis of George Kokkoris, supported by the Institute of Microelectronics of NCSR "Demokritos", with advisors Evangelos Gogolides and Andreas..